发明名称 |
CLEANING APPARATUS AND CLEANING METHOD, COATER/DEVELOPER AND COATING AND DEVELOPING METHOD, AND COMPUTER READABLE STORING MEDIUM |
摘要 |
A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
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申请公布号 |
US2009202951(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
US20090366198 |
申请日期 |
2009.02.05 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
YAMAMOTO TARO;YOSHITAKA NAOTO;NISHIKIDO SHUICHI;TOKUNAGA YOICHI |
分类号 |
G03F7/20;B08B3/00;G03B27/32 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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