发明名称
摘要 The present invention is directed to an arrangement for switching high electric currents by way of a gas discharge at high voltages or for generating gas discharge plasma emitting EUV radiation. It is the object of the invention to find a novel possibility for generating a hollow cathode plasma that permits a longer life of the cathodes of short wavelength-emitting gas discharge radiation sources and pseudospark switches, also in high-power operation. This object is met in that the metal wall between the hollow cathode space and the discharge space has a thickness on the order of the centimeter range so that the openings of the metal wall change into relatively long channels and in that substantially radially extending cooling channels are introduced in the metal wall to reduce the ion erosion of the metal wall of the hollow cathode through efficient cooling.
申请公布号 JP4314309(B2) 申请公布日期 2009.08.12
申请号 JP20080061128 申请日期 2008.03.11
申请人 发明人
分类号 H05G2/00;H01L21/027 主分类号 H05G2/00
代理机构 代理人
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