发明名称 HOLLOW STRUCTURE FORMING SUBSTRATE AND METHOD OF PRODUCING THE SAME
摘要 <p>A hollow structure forming substrate includes: a surface on which a plastic-deformation film is formed by using a plastic-deformable material; a plurality of regularly-arranged gas-retaining spaces; a plurality of gas leading-out parts each having a first opening which faces corresponding one of the gas-retaining spaces and a second opening which faces the surface, the gas leading-out parts leads out gas retained in the gas-retaining spaces toward the surface under depressurized environmental condition; and a plurality of infiltration preventing spaces each provided in a space between corresponding one of the first openings and corresponding one of the second openings, in which the infiltration preventing spaces prevent infiltration of the plastic-deformable material from the surface into the gas-retaining spaces.</p>
申请公布号 EP2086737(A1) 申请公布日期 2009.08.12
申请号 EP20080703414 申请日期 2008.01.10
申请人 RICOH COMPANY, LTD. 发明人 MASUZAWA, MASAHIRO;OHGAKI, MASARU
分类号 B29C44/00;B29C33/38;B29C44/34;B29C49/00;B29C49/58;B29D11/00;B29D22/00;B29D22/02;B29L11/00;G03F7/20 主分类号 B29C44/00
代理机构 代理人
主权项
地址