发明名称 |
HOLLOW STRUCTURE FORMING SUBSTRATE AND METHOD OF PRODUCING THE SAME |
摘要 |
<p>A hollow structure forming substrate includes: a surface on which a plastic-deformation film is formed by using a plastic-deformable material; a plurality of regularly-arranged gas-retaining spaces; a plurality of gas leading-out parts each having a first opening which faces corresponding one of the gas-retaining spaces and a second opening which faces the surface, the gas leading-out parts leads out gas retained in the gas-retaining spaces toward the surface under depressurized environmental condition; and a plurality of infiltration preventing spaces each provided in a space between corresponding one of the first openings and corresponding one of the second openings, in which the infiltration preventing spaces prevent infiltration of the plastic-deformable material from the surface into the gas-retaining spaces.</p> |
申请公布号 |
EP2086737(A1) |
申请公布日期 |
2009.08.12 |
申请号 |
EP20080703414 |
申请日期 |
2008.01.10 |
申请人 |
RICOH COMPANY, LTD. |
发明人 |
MASUZAWA, MASAHIRO;OHGAKI, MASARU |
分类号 |
B29C44/00;B29C33/38;B29C44/34;B29C49/00;B29C49/58;B29D11/00;B29D22/00;B29D22/02;B29L11/00;G03F7/20 |
主分类号 |
B29C44/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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