发明名称 TIN OXIDE-BASED SPUTTERING TARGET, LOW RESISTIVITY, TRANSPARENT CONDUCTIVE FILM, METHOD FOR PRODUCING SUCH FILM AND COMPOSITION FOR USE THEREIN
摘要 <p>The present invention is directed to a composition consisting essentially of: a) from about 60 to about 99 mole % of SnO2, and b) from about 1 to about 40 mole % of one or more materials selected from the group consisting of i) Nb2O5, ii) NbO, iii) NbO2, iv) WO2, v) a material selected consisting of a) a mixture of MoO2 and Mo and b) Mo, vi) W, vii) Ta2O5, and viii) mixtures thereof, wherein the mole % s are based on the total product and wherein the sum of components a) and b) is 100. The invention is also directed to the sintered product of such composition, a sputtering target made from the sintered product and a transparent electroconductive film made from the composition.</p>
申请公布号 EP2086906(A2) 申请公布日期 2009.08.12
申请号 EP20070868630 申请日期 2007.10.31
申请人 H. C. STARCK, INC. 发明人 KUMAR, PRABHAT;WU, RONG-CHEIN RICHARD;SUN, SHUWEI
分类号 C04B35/457;C03C17/245;C23C14/08;C23C14/34 主分类号 C04B35/457
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