| 摘要 |
A plasma processing apparatus is provided to improve plasma ignition and ignition stability by arranging a slot to a vertical top direction of a tilted surface. A plasma processing apparatus(11) includes a processing vessel(12) having a top opening, a dielectric(15), and an antenna(24). The dielectric has a tilted surface, and is arranged in order to close the top opening of the processing vessel. The tilted surface is tilted in order to consecutively change a thickness size of a bottom surface. The antenna is arranged on a top surface of the dielectric. The antenna generates plasma on the bottom surface of the dielectric by supplying a microwave to the dielectric. The antenna has a plurality of slots positioned in a vertical top direction of the tilted surface. |
