| 摘要 |
A semiconductor device includes: a semiconductor substrate that has an integrated circuit; a plurality of electrodes that is formed on the semiconductor substrate, the plurality of the electrodes being electrically coupled to the integrated circuit; a passivation film that is formed on the semiconductor substrate, the passivation film having an opening on at least a part of one of the plurality of electrodes; a resin protrusion that is disposed on the passivation film; and a plurality of wiring lines that extend to a surface of the resin protrusion, each of the plurality of wiring lines extending from one of the plurality of the electrodes, a first portion of each of the plurality of wiring lines being positioned at an uppermost edge of the resin protrusion, a second portion of each of the plurality of wiring lines being positioned between one of the plurality of electrodes and the uppermost edge of the resin protrusion, a width of the first portion of each of the plurality of wiring lines being narrower than a width of at least a part of the second portion of each of the plurality of wiring lines.
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