CHAMBER OF GAS ANALYZER USING PLASMA

摘要

A process chamber of a gas analysis device using the plasma is provided to minimize the refraction of an optical signal by forming a space while increasing the incidence quantity of the optical signal. A process chamber of a gas analysis device using the plasma comprises an optical signal part insertion hole(210). A treatment chamber induces the process gas exhausted from a process chamber in order to generate the plasma. One end of the treatment chamber is blocked and the other end opened. The optical signal part insertion hole is formed integrally at one end of the treatment chamber into the other end part direction. The end of the optical signal part insertion hole is formed at a coil reeled in the outer circumference of the treatment chamber to overlapping or the location which is not overlapped. The end of protrusion is formed in the coil reeled in the outer circumference of the treatment chamber to overlapping or the location which is not overlapped.