METHOD FOR FORMING A THIN LAYER AND THIN LAYER FORMING APPARATUS FOR PERFORMING THE SAME

摘要

A method for forming a thin film and a thin film forming apparatus for performing the same are provided to easily form a thin film on a substrate to be processed by maintaining temperature of the substrate to be processed under 200‹C. A thin film forming apparatus includes a reaction chamber(110), an energy supply part(120), and a gas supply part(130). The reaction chamber includes a heating part(112) and a cooling process part(117). The cooling process part controls temperature of the reaction chamber. The heating part activates a resource gas. The energy supply part supplies a power source to the heating part, and heats the heating part into set temperature. The gas supply part injects a first gas to the reaction chamber while heating the heating part. The first gas is a carrier gas or a source gas. If the temperature of the substrate to be processed is stabilized, the gas supply part injects a second gas to the reaction chamber.