| 摘要 |
<p>A photo-curable resin composition is provided to ensure excellent transparency, heat resistance, chemical resistance, adhesion, surface hardness, high planarization performance and resolution. A photo-curable resin composition comprises [A] (a) a monomer having an acryl group, a monomer having C3~C12 aliphatic cyclic group, and a copolymer having a carboxyl group at a main chain, and (b) a monomer having a carboxyl group, a monomer having substituted or unsubstituted maleimide group, and a monomer having an oxetane group at a main chain; [B] a component including at least one monomer having a resorcin type oxetan monomer and at least one monomer having at least two acryl functional groups; [C] a radical generating photopolymerization initiator; and [D] solvent.</p> |
