| 摘要 |
A substrate processing apparatus is provided to improve the availability of process space within a chamber by extending the substrate processing region within the chamber. The substrate processing apparatus(100) comprises the chamber(110), and the chemical supply line(105) and the drive unit(150). The chamber is classified into the process area(111) and the non-processed area(113) for the substrate. A plurality of chemical supplying lines is arranged in the process area to supply the processing chemical to the substrate. The drive unit includes the first driving part, the second driver part and the transition. The transition part(140) is connected to the chemical supplying line and converts the second oscillation into the swing motion of chemical supplying lines.
|
