| 摘要 |
FIELD: electricity. ^ SUBSTANCE: invention relates to plasma techniques for depositing film coatings and is meant for cleaning off the microdrop fraction from a plasma stream from arc evaporators. The device has a case 1, louver system of enclosed coaxial electrodes 4 installed in the case, covering the aperture of the vacuum-arc evaporator, electrically connected to each other in series and anti-parallel and connected to a current source and to the positive terminal of a voltage source, connected by the second terminal to the anode of the vacuum-arc evaporator, and made in form of arched and hollow pipes joined on the entire length, connected to a cooling agent supply system. At least one electromagnetic coil is installed after the louver system of electrodes 4. Electrodes of the said system 4 have a quadratic surface. The case 1 is provided with a cooling jacket 2. In front the said electrode system 4, coaxially with it, a splitting element 5 is fitted on a cooled hollow holder 6, mounted on the case 1 and covering gaps, formed by curves of pipes. The splitting element 5 is joined to the cooling jacket 2 of the case 1 and is in form of a hemisphere or flattened cone and has a magnetic field source. ^ EFFECT: increased efficiency, reduced operating costs and reduced size of the device. ^ 8 cl, 1 tbl, 4 dwg |
