发明名称 CHEMICALS SUPPLYING SYSTEM AND APPARATUS FOR TREATMENT OF THE SUBSTRATE COMPRISING THE SAME
摘要 A chemicals supplying system and an apparatus for treatment of the substrate comprising the same are provided to prevent the decrease of production dud to a malfunction by sensing the amount of the chemicals inside each tank from a height sensor and a load cell. In a chemicals supplying system and an apparatus for treatment of the substrate comprising the same, the chemicals is stored in a tank(100). A chemical supply unit(110) supplies the chemical to the tank, and a feeding valve(122) controls the amount of the chemical supplied to the chemical usage unit in which the chemical stored within the tank is used. A height sensor(210) senses the height of the chemical stored within the tank, and a load cell(220) senses the weight of the chemical stored within the tank. A comparator(310) compares the value sensed in the height sensor and the value sensed in the load cell.
申请公布号 KR20090085337(A) 申请公布日期 2009.08.07
申请号 KR20080011174 申请日期 2008.02.04
申请人 SEMES CO., LTD. 发明人 JANG, HUN
分类号 H01L21/304 主分类号 H01L21/304
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