| 摘要 |
PROBLEM TO BE SOLVED: To enhance the resolution of a surface shape to be detected in a semiconductor device for acquiring the surface shape of an object to be measured. SOLUTION: A first capacity detector circuit layer 20 and a second capacity detector circuit layer 30 provided with individual elements 29, 38 for detecting the capacitances between the object to be measured 60 and individual electrodes 28, 37, are laminated, and each electrode 28, 37 of each element 29, 38 is extended up to a protection layer 50 by each trench 26, 35. Thereby, the number of elements 29, 38 arrangeable per predetermined area can be increased as compared to the case where the device has only one capacity detector circuit layer, and the surface shape of the object 60 can be detected with higher resolution. COPYRIGHT: (C)2009,JPO&INPIT
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