| 摘要 |
PROBLEM TO BE SOLVED: To provide a mother substrate having a plurality of regions to be subjected to discharge, with which variation of drawn pattern quality is reduced by reducing a change in physical properties of the liquid to be discharged from a liquid drop discharge head. SOLUTION: The mother substrate B is relatively moved in a sub-scanning direction or in a main scanning direction intersecting the sub-scanning direction with respect to a plurality of the liquid drop discharge heads 40 in which a plurality of nozzles 58 are formed on columns, which are arranged in the sub-scanning direction being the aligning direction of nozzles 58, and which discharge the liquid with a predetermined discharge width L. The mother substrate B has the plurality of regions to be subjected to discharge, on which the liquid is discharged from the nozzles 58. The plurality of regions to be subjected to discharge includes a first region P to be subjected to discharge and a second region Q to be subjected to discharge with areas different from each other. In the relative movement in the main scanning direction, at least one of the first region P to be subjected to discharge and the second region Q to be subjected to discharge is located in the discharge width L of the liquid drop discharge heads 40. COPYRIGHT: (C)2009,JPO&INPIT
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