| 发明名称 |
RADIATION-SENSITIVE COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cyclic compound having high sensitivity, high resolution, high etching resistance and a low outgas content which forms a resist pattern with a good shape, a radiation-sensitive composition containing the compound and a method of forming a resist pattern using the radiation-sensitive composition. <P>SOLUTION: The cyclic compound satisfies a specific condition represented by formula (1). The radiation-sensitive composition contains the compound. The method of forming a resist pattern comprises using the radiation-sensitive composition. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009173623(A) |
申请公布日期 |
2009.08.06 |
| 申请号 |
JP20080110680 |
申请日期 |
2008.04.21 |
| 申请人 |
MITSUBISHI GAS CHEM CO INC |
发明人 |
ECHIGO MASATOSHI;OGURO MASARU |
| 分类号 |
C07C39/17;C07C39/42;C07C215/70;G03F7/004;G03F7/038;G03F7/039;G03F7/11;H01L21/027 |
主分类号 |
C07C39/17 |
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