RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, RESIST PATTERN FORMING METHOD AND FLUORINE-CONTAINING COPOLYMER

摘要

PROBLEM TO BE SOLVED: To provide: a new fluorine-containing copolymer useful as an additive for a resist composition for liquid immersion lithography; a resist composition for liquid immersion lithography containing the same; and a resist pattern forming method.

SOLUTION: The resist composition for liquid immersion lithography includes a base component (A) of which the solubility in an alkali developer changes by the action of an acid, an acid generator component (B) which generates an acid upon exposure to light, and the fluorine-containing copolymer (C) having a constitutional unit represented by general formula (c1-1).

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