发明名称 PROCESS FOR ADSORBING PLATING CATALYST, PROCESS FOR PRODUCTION OF SUBSTRATE PROVIDED WITH METAL LAYER AND PLATING CATALYST FLUID FOR USE IN BOTH PROCESS
摘要 <P>PROBLEM TO BE SOLVED: To provide a process for selectively adsorbing a plating catalyst only to the desired region of a substrate at which a hydrophobic plating catalyst receiving region is formed, and to provide a process for the production of a substrate provided with a metal layer using the same. <P>SOLUTION: Disclosed is a process for adsorbing a plating catalyst which comprises the step of applying a photosensitive resin composition which contains a compound bearing both a polymerizable group and a group interactive with a plating catalyst and in which a cured material is a hydrophobic surface, the step of subjecting the resulting substrate to patternwise light exposure to cure the composition, the step of subjecting the resulting substrate to development to remove uncured part of the composition, and the step of bringing an aqueous plating catalyst fluid containing both a plating catalyst and an organic solvent into contact with the resulting substrate, wherein when being contacted with the catalyst fluid containing palladium as a plating catalyst, provided that an adsorption in a plating catalyst receiving area as Amg/m<SP>2</SP>and an adsorption in a non-formed region as Bmg/m<SP>2</SP>, formulae (A):10 mg/m<SP>2</SP>&le;A&le;150 mg/m<SP>2</SP>and formula (B):0 mg/m<SP>2</SP>&le;B&le;5 mg/m<SP>2</SP>are satisfied. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009174041(A) 申请公布日期 2009.08.06
申请号 JP20080108577 申请日期 2008.04.18
申请人 FUJIFILM CORP 发明人 SATO MASATAKA
分类号 C23C18/30;C23C18/20;C25D5/56;G03F7/038;G03F7/40;H01L21/288;H05K3/18 主分类号 C23C18/30
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