摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin precursor composition which is excellent in sensitivity and resolution and forms a patterned cured film, and also to provide a method for producing a patterned cured film, and electronic components. <P>SOLUTION: The positive photosensitive resin precursor composition contains: (a) a branched polymer having a structural unit represented by a general formula (1), and obtained by adding, in polymer synthesis, at least one compound selected from the group consisting of polyamines having three or more amino groups, polyhydric acid anhydrides having three or more anhydride groups, or polyisocyanates having three or more isocyanate groups; (b) a compound crosslinking with the component (a) by heat, or polymerizing itself; and (c) a compound which generates an acid upon irradiation with actinic rays. <P>COPYRIGHT: (C)2009,JPO&INPIT |