发明名称 ELECTRON BEAM DRAWING METHOD, FINE PATTERN DRAWING SYSTEM AND CONCAVO-CONVEX PATTERN CARRIER
摘要 PROBLEM TO BE SOLVED: To draw a servo pattern and a groove pattern in a fine pattern of a discrete track media with a given dose at a high speed with high accuracy. SOLUTION: A fine pattern including a servo pattern 12 comprising servo elements 13 and a groove pattern 15 separating adjacent data tracks in a groove state, is drawn by scanning an electron beam EB on a substrate 10 coated with a resist 11. The drawing process includes: drawing the servo pattern 12 by scanning the electron beam to fill servo elements 13 of a plurality of tracks each by each by deflected in X-Y directions and reciprocal oscillation in a radial direction, while the substrate is rotated in one direction; followed by configuring the groove pattern 15 as an arrangement of a plurality of groove elements 16 prepared by dividing the pattern at a predetermined angle, and drawing the groove pattern 15 by greatly deflecting the electron beam in a circumference direction so as to sequentially scan the groove elements 16 of a plurality of tracks. Thus, a plurality of tracks are drawn in a single rotation of the substrate. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009175402(A) 申请公布日期 2009.08.06
申请号 JP20080013532 申请日期 2008.01.24
申请人 FUJIFILM CORP 发明人 KOMATSU KAZUNORI;USA TOSHIHIRO
分类号 G03F7/20;G01Q10/04;G11B5/65;G11B5/84;H01J37/305;H01L21/027 主分类号 G03F7/20
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