发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 A semiconductor device has an external wiring for GND formed over an underside surface of a wiring substrate. A plurality of via holes connecting to the external wiring for GND are formed to penetrate the wiring substrate. A first semiconductor chip of high power consumption, including HBTs, is mounted over a principal surface of the wiring substrate. The emitter bump electrode of the first semiconductor chip is connected in common with emitter electrodes of a plurality of HBTs formed in the first semiconductor chip. The emitter bump electrode is extended in a direction in which the HBTs line up. The first semiconductor chip is mounted over the wiring substrate so that a plurality of the via holes are connected with the emitter bump electrode. A second semiconductor chip lower in heat dissipation value than the first semiconductor chip is mounted over the first semiconductor chip.
申请公布号 US2009194792(A1) 申请公布日期 2009.08.06
申请号 US20090413010 申请日期 2009.03.27
申请人 RENESAS TECHNOLOGY CORP. 发明人 KONISHI SATORU;ENDO TSUNEO;NAKAJIMA HIROKAZU;UMEMOTO YASUNARI;SASAKI SATOSHI;KUSANO CHUSHIRO;IMAMURA YOSHINORI;KUROKAWA ATSUSHI
分类号 H01L21/28;H01L27/082;H01L21/331;H01L21/8222;H01L21/84;H01L23/34;H01L23/482;H01L23/498;H01L25/065;H01L25/07;H01L25/16;H01L25/18;H01L29/417;H01L29/423;H01L29/45;H01L29/49;H01L29/737;H01L29/739;H01L29/78 主分类号 H01L21/28
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