发明名称 THIN FILM TRANSISTOR USING AN OXIDE SEMICONDUCTOR AND DISPLAY
摘要 A thin film transistor includes a gate electrode, a gate insulation layer, a channel layer, a source electrode, and a drain electrode formed on a substrate, in which: the channel layer contains indium, germanium, and oxygen; and the channel layer has a compositional ratio expressed by In/(In+Ge) of 0.5 or more and 0.97 or less.
申请公布号 WO2009096608(A1) 申请公布日期 2009.08.06
申请号 WO2009JP52013 申请日期 2009.01.30
申请人 CANON KABUSHIKI KAISHA;GOYAL, AMITA;ITAGAKI, NAHO;IWASAKI, TATSUYA 发明人 GOYAL, AMITA;ITAGAKI, NAHO;IWASAKI, TATSUYA
分类号 H01L29/786 主分类号 H01L29/786
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