CERAMIC-SPRAYED MEMBER, METHOD FOR PRODUCING THE SAME, AND POLISHING MEDIUM FOR CERAMIC-SPRAYED MEMBER

摘要

PROBLEM TO BE SOLVED: To provide a ceramic-sprayed member which can reduce the degree of contamination on a wafer from a member subjected to thermal spraying in order to improve plasma resistance and which enables stable production in a process using halogen plasma, such as a semiconductor production process; a method for producing the same, and to provide a polishing medium for the ceramic-sprayed member.

SOLUTION: The ceramic-sprayed member is characterized in that it has a sprayed ceramic film formed on the surface of a base material and splats of the surface of the sprayed ceramic film are removed.

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