发明名称 EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a low-cost exposure device that forms a high-definition mask pattern on an outer peripheral surface of an optically transparent cylindrical base material in a short time. <P>SOLUTION: The exposure device for a photoreceptor having at least one photosensitive layer on the outer peripheral surface of the optically transparent cylindrical base material includes at least: an insertion slot for a mask pattern film; a support means for pressing the mask pattern film against the photoreceptor and also supporting the photoreceptor; a support means for supporting the photoreceptor; and an optically transparent conveying means for covering a portion of the outer peripheral surface of the photoreceptor, and clipping and conveying the mask pattern film with the photoreceptor. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009175287(A) 申请公布日期 2009.08.06
申请号 JP20080012110 申请日期 2008.01.23
申请人 MITSUBISHI PAPER MILLS LTD 发明人 TAKEI TAKANORI
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利