发明名称 ANTIREFLECTION PLATE AND METHOD FOR MANUFACTURING ANTIREFLECTION STRUCTURE THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide an antireflection structure which is formed by atmospheric pressure plasma and greatly reduces a material, time and cost required for manufacturing an antireflection plate. <P>SOLUTION: The antireflection plate and a method for manufacturing the antireflection structure thereof are disclosed. The method includes the following steps. First, an object to be treated is provided in a reactive area. Next a plasma source is provided in the reactive area. Then the plasma source is ionized to form plasma in atmospheric pressure. Next the surface of the object to be treated is treated by plasma so as to form a plurality of micro-protuberances on the surface of the object to be treated. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009175729(A) 申请公布日期 2009.08.06
申请号 JP20080333873 申请日期 2008.12.26
申请人 IND TECHNOL RES INST 发明人 CHEN CHIH-WEI;WU CHIN-JYI;HSIEH WEN-TZONG;HSU WEN-TUNG;LIN CHUN-HUNG
分类号 G02B1/11;B32B7/02;B32B9/00;G02B1/02 主分类号 G02B1/11
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