| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam lithography system that improves throughput. SOLUTION: A first series system of a first transmission path 30A and a first transmission computer 40A is provided between a control computer 2 and a first buffer memory 50A, and a second series system of a second transmission path 30B and a second transmission computer 40B is provided between the control computer 2 and a second buffer memory 50B. Thus, divided drawing data for each field from a drawing data memory device 1 are sent to the first and second series systems. On the basis of the respective divided drawing data read out from the buffer memories 50A and 50B, the position of a stage wherein a material to be drawn is placed and/or the irradiation position of a charged particle beam on the material to be drawn is controlled, and a pattern in drawn on the material to be drawn by each of fields. COPYRIGHT: (C)2009,JPO&INPIT
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