| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide mask blanks strengthening absorption while preventing an increase in power consumption for an electrostatic chuck, a mask, a mask holding apparatus, an exposure apparatus and a method for manufacturing a device. <P>SOLUTION: A reticle blanks RB includes a plate shaped blanks body 40 having a first face 41 and a second face 42 located on the reverse side of the first face 41, and a conductive layer 43 formed on the side of the first face 41 of the blanks body 40. On the conductive layer 43, many projections 46 are formed in a regular manner at predetermined intervals. A reflective layer and an absorbing layer thereon are formed on the second face 42 side of the blanks body 40 of the reticle blanks RB to complete the reticle blanks. In the reticle, a tip face 47 of each projection 46 closely contacts the absorbing face of the electrostatic chuck. <P>COPYRIGHT: (C)2009,JPO&INPIT |
