| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method forming a high-definition pattern on a substrate on the basis of alignment marks provided at four corners of the substrate even when the marks cannot be simultaneously imaged. SOLUTION: A first imaging device 61 and a second imaging device 63 are provided on both sides of a drawing area of a carriage 30. First and second alignment marks WA, WB are imaged by the first imaging device at a supply/discharge position. The arrangement position of each carriage 30 is changed on the basis of first and second image data thereof. A liquid droplet is ejected at a prescribed timing when it is moved to a return position. At the return position, third and fourth alignment marks WC, WD are imaged by the second imaging device. Ejection timing position data for ejecting the droplet Fb are newly generated on the basis of third and fourth image data thereof and the first and second image data. Thereafter, the liquid droplet is ejected with the new ejection timing position data. COPYRIGHT: (C)2009,JPO&INPIT
|
