发明名称 |
ELECTRICALLY DRIVEN OPTICAL PROXIMITY CORRECTION |
摘要 |
An approach that provides electrically driven optical proximity correction is described. In one embodiment, there is a method for performing an electrically driven optical proximity correction. In this embodiment, an integrated circuit mask layout representative of a plurality of layered shapes each defined by features and edges is received. A lithography simulation is run on the mask layout. An electrical characteristic is extracted from the output of the lithography simulation for each layer of the mask layout. A determination as to whether the extracted electrical characteristic is in conformance with a target electrical characteristic is made. Edges of the plurality of layered shapes in the mask layout are adjusted in response to determining that the extracted electrical characteristic for a layer in the mask layout fails to conform with the target electrical characteristic.
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申请公布号 |
US2009199151(A1) |
申请公布日期 |
2009.08.06 |
申请号 |
US20080024188 |
申请日期 |
2008.02.01 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BANERJEE SHAYAK;CULP JAMES A.;ELAKKUMANAN PRAVEEN;LIEBMANN LARS W. |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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