METHOD AND APPARATUS FOR SELECTIVELY PATTERNING FREE STANDING QUANTOM DOT (FSQDT) POLYMER COMPOSITES

摘要

Free standing quantum do (FSQDT) polymer composites and a method and apparatus for patterning the FSQDT polymer composites is provided. The method for patterning the FSQDT polymer composites includes creating a solution including FSQDTs (102) where each of the FSQDTs has a plurality of reactive ligands chemically attached thereto. The method further includes providing a substrate (104), forming a coated substrate by coating a surface of the substrate with a layer of the solution (106), and providing a photo mask having a predetermined pattern thereon transparent to a predetermined radiation over the coated substrate (108). Finally, the method includes exposing a portion of the coated substrate to the predetermined radiation passing through the mask to pattern a polymer matrix in the predetermined pattern while adhering the FSQDTs to the polymer matrix (110) to form the FSQDT polymer composite.