An electrostatic chuck includes a layer having a plurality of protrusions to support a workpiece, wherein at least a portion of the layer has a first plurality of the plurality of protrusions. The first plurality of protrusions is spaced to geometrically form a pattern of hexagons. The first plurality of protrusions may be spaced an equal distance from adjacent protrusions and the equal distance may be about 4.0 millimeters from a center of one protrusion to a center of another protrusion. The present disclosure reduces peak mechanical stress levels conventionally present along an edge of each protrusion. Reducing such mechanical stress levels helps reduce backside damage to a supported workpiece, which in turn can reduce the generation of unwanted particles caused by such damage.
申请公布号
WO2009064974(A3)
申请公布日期
2009.08.06
申请号
WO2008US83540
申请日期
2008.11.14
申请人
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;LISCHER, D., JEFFREY;STONE, DALE, K.;STONE, LYUDMILA;SUURONEN, DAVID;BLAKE, JULIAN, G.
发明人
LISCHER, D., JEFFREY;STONE, DALE, K.;STONE, LYUDMILA;SUURONEN, DAVID;BLAKE, JULIAN, G.