发明名称 EMBOSSED ELECTROSTATIC CHUCK
摘要 An electrostatic chuck includes a layer having a plurality of protrusions to support a workpiece, wherein at least a portion of the layer has a first plurality of the plurality of protrusions. The first plurality of protrusions is spaced to geometrically form a pattern of hexagons. The first plurality of protrusions may be spaced an equal distance from adjacent protrusions and the equal distance may be about 4.0 millimeters from a center of one protrusion to a center of another protrusion. The present disclosure reduces peak mechanical stress levels conventionally present along an edge of each protrusion. Reducing such mechanical stress levels helps reduce backside damage to a supported workpiece, which in turn can reduce the generation of unwanted particles caused by such damage.
申请公布号 WO2009064974(A3) 申请公布日期 2009.08.06
申请号 WO2008US83540 申请日期 2008.11.14
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;LISCHER, D., JEFFREY;STONE, DALE, K.;STONE, LYUDMILA;SUURONEN, DAVID;BLAKE, JULIAN, G. 发明人 LISCHER, D., JEFFREY;STONE, DALE, K.;STONE, LYUDMILA;SUURONEN, DAVID;BLAKE, JULIAN, G.
分类号 H01L21/683;H01L21/687 主分类号 H01L21/683
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