发明名称 |
SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE SUPPORT TO BE USED FOR THE APPARATUS |
摘要 |
The substrate treatment apparatus according to the present invention includes a substrate holding mechanism including a support member which supports a substrate, and an extension surface which laterally surrounds one major surface of the substrate supported by the support member and extends continuously to the major surface of the substrate, a rotation mechanism which rotates the substrate holding mechanism, and an etching liquid supply mechanism which supplies an etching liquid onto the major surface of the substrate held by the substrate holding mechanism.
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申请公布号 |
US2009194234(A1) |
申请公布日期 |
2009.08.06 |
申请号 |
US20090363066 |
申请日期 |
2009.01.30 |
申请人 |
ARAI KENICHIRO;NADA KAZUNARI |
发明人 |
ARAI KENICHIRO;NADA KAZUNARI |
分类号 |
C23F1/08 |
主分类号 |
C23F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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