发明名称 |
THIN FILM TRANSISTOR |
摘要 |
<p>Provided is a thin film transistor, which is manufactured by coating process wherein film forming process is simple, and has a small variance of TFT characteristics. In the thin film transistor, a gate electrode is formed on a substrate, and an insulating thin film is formed on the gate electrode. The gate electrode is formed with a line width smaller than a channel length, and a cross-section has linear or curved lines forming a semicircular, semielliptical or a protruding structure. A plurality of the gate electrodes are arranged from a source electrode toward a drain electrode without being overlapped with each other.</p> |
申请公布号 |
WO2009096525(A1) |
申请公布日期 |
2009.08.06 |
申请号 |
WO2009JP51586 |
申请日期 |
2009.01.30 |
申请人 |
NEC CORPORATION;ENDOH, HIROYUKI;TOGUCHI, SATORU;NUMATA, HIDEAKI |
发明人 |
ENDOH, HIROYUKI;TOGUCHI, SATORU;NUMATA, HIDEAKI |
分类号 |
H01L51/30;H01L29/786;H01L51/05;H01L51/40 |
主分类号 |
H01L51/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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