发明名称 THIN FILM TRANSISTOR
摘要 <p>Provided is a thin film transistor, which is manufactured by coating process wherein film forming process is simple, and has a small variance of TFT characteristics. In the thin film transistor, a gate electrode is formed on a substrate, and an insulating thin film is formed on the gate electrode. The gate electrode is formed with a line width smaller than a channel length, and a cross-section has linear or curved lines forming a semicircular, semielliptical or a protruding structure. A plurality of the gate electrodes are arranged from a source electrode toward a drain electrode without being overlapped with each other.</p>
申请公布号 WO2009096525(A1) 申请公布日期 2009.08.06
申请号 WO2009JP51586 申请日期 2009.01.30
申请人 NEC CORPORATION;ENDOH, HIROYUKI;TOGUCHI, SATORU;NUMATA, HIDEAKI 发明人 ENDOH, HIROYUKI;TOGUCHI, SATORU;NUMATA, HIDEAKI
分类号 H01L51/30;H01L29/786;H01L51/05;H01L51/40 主分类号 H01L51/30
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