发明名称 |
METHOD FOR MANUFACTURING SILICON-CONTAINING COMPOUND OXIDE SOL, METHOD FOR MANUFACTURING SILICON-CONTAINING HOLOGRAM RECORDING MATERIAL, AND HOLOGRAM RECORDING MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a homogeneous compound oxide sol containing Si and other metals except for Si, and a method for manufacturing a Si-containing hologram recording material using a homogenous compound oxide sol. SOLUTION: The method for manufacturing a compound oxide sol containing Si and other metals except for Si as a metallic element includes steps of: mixing a silane compound and an alkoxide compound of other metals except for Si to make the mixture react to obtain a precursor of a compound oxide; and adding water to the precursor of the compound oxide to hydrolyze alkoxyl groups of other metals except for Si and subsequently subjecting the hydrolysis product to condensation reaction to produce a compound oxide. The hologram recording medium 11 has a hologram recording layer 21 made of the hologram recording material obtained by the above method. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009175367(A) |
申请公布日期 |
2009.08.06 |
申请号 |
JP20080013092 |
申请日期 |
2008.01.23 |
申请人 |
TDK CORP |
发明人 |
KOSUDA ATSUKO;HAYASHIDA NAOKI;YOSHINARI JIRO;FUKUI TOSHIMI;NAKAMOTO JUNKO;YAMAKI SAORI;MENDOZA HEIDY HODEX VISBAL |
分类号 |
G03H1/02;G03F7/004;G03F7/075;G11B7/0065 |
主分类号 |
G03H1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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