发明名称 METHOD FOR MANUFACTURING SILICON-CONTAINING COMPOUND OXIDE SOL, METHOD FOR MANUFACTURING SILICON-CONTAINING HOLOGRAM RECORDING MATERIAL, AND HOLOGRAM RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a homogeneous compound oxide sol containing Si and other metals except for Si, and a method for manufacturing a Si-containing hologram recording material using a homogenous compound oxide sol. SOLUTION: The method for manufacturing a compound oxide sol containing Si and other metals except for Si as a metallic element includes steps of: mixing a silane compound and an alkoxide compound of other metals except for Si to make the mixture react to obtain a precursor of a compound oxide; and adding water to the precursor of the compound oxide to hydrolyze alkoxyl groups of other metals except for Si and subsequently subjecting the hydrolysis product to condensation reaction to produce a compound oxide. The hologram recording medium 11 has a hologram recording layer 21 made of the hologram recording material obtained by the above method. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009175367(A) 申请公布日期 2009.08.06
申请号 JP20080013092 申请日期 2008.01.23
申请人 TDK CORP 发明人 KOSUDA ATSUKO;HAYASHIDA NAOKI;YOSHINARI JIRO;FUKUI TOSHIMI;NAKAMOTO JUNKO;YAMAKI SAORI;MENDOZA HEIDY HODEX VISBAL
分类号 G03H1/02;G03F7/004;G03F7/075;G11B7/0065 主分类号 G03H1/02
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