发明名称 IMAGE SENSOR AND FABRICATING METHOD THEREOF
摘要 An image sensor and a manufacturing method thereof are provided to improve the electric charge accumulation ability by forming the effective potential barrier. An isolation insulating layer(121) is formed within a substrate. A separation impurity region(122a) of the first conductivity type is formed under the isolation insulating layer into multilayer. An impurity region(122b) of the second conductive type is formed with multilayer within the substrate. The deep well of the first conductivity type is formed within the substrate. The separation impurity region formed with multilayer contacts to the deep well. The impurity of the first conductivity type is ion-implanted into the substrate at the plurality of times. The separation impurity region of multilayer is formed in the isolation insulating layer.
申请公布号 KR20090084168(A) 申请公布日期 2009.08.05
申请号 KR20080010188 申请日期 2008.01.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, HWANG YOON;KIM, JUNG HYEON;KIM, GI TAE
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
主权项
地址
您可能感兴趣的专利