发明名称 HIGH MOBILITY POWER METAL-OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTORS
摘要 <p>High mobility P-channel power metal oxide semiconductor field effect transistors. In accordance with an embodiment of the present invention, a power MOSFET is fabricated such that the holes flow in an inversion/accumulation channel, which is along the (110) crystalline plane, or equivalents, and the current flow is in the [110] direction, or equivalents, when a negative potential is applied to the gate with respect to the source. The enhanced channel mobility of holes leads to a reduction of the channel portion of the on-state resistance, thereby advantageously reducing total "on" resistance of the device.</p>
申请公布号 EP1966827(A4) 申请公布日期 2009.08.05
申请号 EP20060848908 申请日期 2006.12.22
申请人 VISHAY-SILICONIX 发明人 PATTANAYAK, DEVA;CHEN, KUO-IN;CHAU, THE-TU
分类号 H01L29/78;H01L29/04;H01L29/423 主分类号 H01L29/78
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