| 摘要 |
<p>A beam shape iris diaphragm and a pattern forming device using the same are provided to expose the region to form a nano pattern without overlapping the electronic beams. An electronic beam is irradiated on a substrate on which the electron-beam resist is coated for the nano pattern formation. A plate(211) is arranged on the top of substrate and an opening(215) of the square shape is formed. The length of one side of square is set up in the range of 5 to 1000um. The electronic beam in which the nano pattern information is included is irradiated on the substrate on which the electron-beam resist is coated and the nano pattern is formed on the substrate. A beam shape iris diaphragm(210) is irradiated on the substrate, and controls the shape of the electronic beam which is arranged on the top of substrate. A substrate holder(220) moves on the plane which is parallel to the plane of the beam shape iris diaphragm.</p> |
