发明名称 |
Method for producing conductive oxide-deposited substrate and MIS laminated structure |
摘要 |
<p>A method for producing a conductive oxide-deposited substrate including depositing a conductive oxide thin film over a substrate, subjecting the conductive oxide thin film to heat treatment by irradiating with a condensed laser beam so as to be thermally changed in part, and subjecting the conductive oxide thin film to etching treatment so as to remove a part which has not been thermally changed, wherein the conductive oxide thin film absorbs the laser beam, and at least a part of the conductive oxide thin film is an amorphous phase.</p> |
申请公布号 |
EP2086014(A2) |
申请公布日期 |
2009.08.05 |
申请号 |
EP20090250256 |
申请日期 |
2009.01.30 |
申请人 |
RICOH COMPANY, LTD. |
发明人 |
MIURA, HIROSHI;TAKEUCHI, KOHJI;TOYOSHIMA, NOBUAKI |
分类号 |
H01L31/02;H01L21/3213;H01L21/77;H01L29/49;H01L29/786;H01L31/0224;H01L31/18 |
主分类号 |
H01L31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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