发明名称 MANUFACTURING METHOD OF THIN FILM FOR DIFFUSION BARRIER AND THIN FILM FOR DIFFUSION BARRIER PRODUCED THEREBY
摘要 A diffusion barrier manufacturing method and a diffusion barrier manufactured by the same are provided to control impurity content and fine structure in order to prevent diffusion by controlling initial pressure of a chamber before evaporation. A diffusion barrier manufacturing method comprises following steps. The content of impurity inside a diffusion barrier is controlled by controlling initial pressure inside a chamber, so the fine structure of the diffusion barrier is controlled. The initial pressure is maintained in 1 x10-5torr ~ 5 x 10-5torr within the chamber. The diffusion barrier is made of the transition metal. The transition metal is Mo. The impurity is the oxygen, the nitrogen or the carbon.
申请公布号 KR20090084357(A) 申请公布日期 2009.08.05
申请号 KR20080010488 申请日期 2008.02.01
申请人 POSTECH ACADEMY-INDUSTRY FOUNDATION 发明人 GU, GIL HO;PARK, CHAN GYUNG
分类号 C23C14/00;C23C14/06;C23C14/14 主分类号 C23C14/00
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