发明名称 |
MANUFACTURING METHOD OF THIN FILM FOR DIFFUSION BARRIER AND THIN FILM FOR DIFFUSION BARRIER PRODUCED THEREBY |
摘要 |
A diffusion barrier manufacturing method and a diffusion barrier manufactured by the same are provided to control impurity content and fine structure in order to prevent diffusion by controlling initial pressure of a chamber before evaporation. A diffusion barrier manufacturing method comprises following steps. The content of impurity inside a diffusion barrier is controlled by controlling initial pressure inside a chamber, so the fine structure of the diffusion barrier is controlled. The initial pressure is maintained in 1 x10-5torr ~ 5 x 10-5torr within the chamber. The diffusion barrier is made of the transition metal. The transition metal is Mo. The impurity is the oxygen, the nitrogen or the carbon.
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申请公布号 |
KR20090084357(A) |
申请公布日期 |
2009.08.05 |
申请号 |
KR20080010488 |
申请日期 |
2008.02.01 |
申请人 |
POSTECH ACADEMY-INDUSTRY FOUNDATION |
发明人 |
GU, GIL HO;PARK, CHAN GYUNG |
分类号 |
C23C14/00;C23C14/06;C23C14/14 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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