Monomer having sulfonyl group, polymer thereof and photoresist composition including the same

摘要

A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. wherein, R* is a hydrogen atom or a methyl group, R1 and R2 are independently a C1~C20 alkyl group, a C4~C20 cycloalkyl group, a C6~C20 aryl group or a C7~C20 arylalkyl group, one of R1 and R2 may not exist, and R1 and R2 can be connected to form a ring.