发明名称 Method for manufacturing pattern of light shielding layer and pattern forming body of light shielding layer
摘要 A method for manufacturing a pattern of a light shielding layer and a patter forming body of light shielding layer. After placing a photocatalyst containing layer side substrate having a base material and a photocatalyst containing layer, and a pattern forming body substrate having a substrate and a property changing layer, the property of an exposed part changes by the action of a photocatalyst in a photocatalyst containing layer, to form a wettability pattern having a lyophilic region and a liquid repellent region on the property changing layer. A light shielding layer composition is coated on the whole surface of the pattern forming body substrate on which the above-mentioned wettability pattern is formed, adhering and solidifying a light shielding layer composition only to the lyophilic region, to form a light shielding layer pattern.
申请公布号 US7569330(B2) 申请公布日期 2009.08.04
申请号 US20030414349 申请日期 2003.04.15
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 KOBAYASHI HIRONORI;SONEHARA AKIO
分类号 G02B5/00;G03F7/00;G02B5/20;G02F1/1333;G02F1/1335 主分类号 G02B5/00
代理机构 代理人
主权项
地址