发明名称 |
Method for manufacturing pattern of light shielding layer and pattern forming body of light shielding layer |
摘要 |
A method for manufacturing a pattern of a light shielding layer and a patter forming body of light shielding layer. After placing a photocatalyst containing layer side substrate having a base material and a photocatalyst containing layer, and a pattern forming body substrate having a substrate and a property changing layer, the property of an exposed part changes by the action of a photocatalyst in a photocatalyst containing layer, to form a wettability pattern having a lyophilic region and a liquid repellent region on the property changing layer. A light shielding layer composition is coated on the whole surface of the pattern forming body substrate on which the above-mentioned wettability pattern is formed, adhering and solidifying a light shielding layer composition only to the lyophilic region, to form a light shielding layer pattern.
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申请公布号 |
US7569330(B2) |
申请公布日期 |
2009.08.04 |
申请号 |
US20030414349 |
申请日期 |
2003.04.15 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
KOBAYASHI HIRONORI;SONEHARA AKIO |
分类号 |
G02B5/00;G03F7/00;G02B5/20;G02F1/1333;G02F1/1335 |
主分类号 |
G02B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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