PHOTOSENSITIVE MOLECULAR COMPOUND HAVING OXIME GROUP AND PHOTORESIST COMPOSITION INCLUDING THE SAME

摘要

A photosensitive molecular compound is provided to change solubility about developer without diffusion of acid, to improve resolution of lithography process and line edge roughness, and to improve uniformity of film after coating or patterning. A photosensitive molecular compound has a structure of chemical formula 1. In chemical formula 1, R1 is hydrogen atom or methyl group(CH3); Ra and Rb are independently alkyl group of carbon number 1-6, alkylcarbonyl group of carbon number 2-7, aryl group of carbon number 6-10 or arylcarbonyl group of carbon number 7-11; or Ra and Rb form one group and is alkyl of carbon number 1-20 bonded to nitrogen (N) to become double bond or cycloalkyl group, or arylalkyl group of carbon number 7-20.