Radiation exposure apparatus comprising a gas flushing system
摘要
An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.
申请公布号
US7570342(B2)
申请公布日期
2009.08.04
申请号
US20050294348
申请日期
2005.12.06
申请人
ASML NETHERLANDS B.V.
发明人
SIMON KLAUS;VAN DEN BRINK ENNO;KEIJSERS GERARDUS JOHANNES JOSEPH;VAN DIJK ADRIANUS HUBERTUS HENRICUS;BAIJENS HUBERTUS ANTONIUS MARINUS