发明名称 APPARATUS AND METHOD FOR IMPRINTING A FINE PATTERN
摘要 <p>An apparatus and method for imprinting a fine pattern are provided to enhance the work efficiency of the imprint process by performing an imprint between a stamp and a substrate. The lower chamber(200) supports the substrate(P) in which the photo-crosslinkable polymer resin(R) is coated. The lower chamber transport unit(300) transfers the lower chamber. The upper chamber(400) is ascended and descended in order to form the enclosure in contact with the transferred lower chamber. At this time, the upper chuck(410) supports the stamp(S) in which micro-pattern is imprinted. The dispenser is coated with the photo-crosslinkable polymer resin. The ultra-violet ray lamp irradiates the ultraviolet ray in the photo-crosslinkable polymer resin.</p>
申请公布号 KR20090083555(A) 申请公布日期 2009.08.04
申请号 KR20080009421 申请日期 2008.01.30
申请人 ADP ENGINEERING CO., LTD. 发明人 KWON, GYU HO;KIM, EUN SUK;AHN, HYUN HWAN;LIM, YONG JIN;CHOI, JUNG SU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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