ETCHANT COMPOSITION AND METHOD FOR FABRICATING METAL PATTERN

摘要

An etchant composition, and a method for forming a metal pattern by using the composition are provided to prevent the generation of etching residue, the generation of electrical short and the decrease of brightness. An etchant composition comprises 0.5~20 weight% of (NH4)2S2O8; 0.1~5 weight% of a phosphate; and 75~99.4 weight% of water. Preferably the phosphate is at least one selected from the phosphoric acids whose 1-3 hydrogen atoms are substituted with an alkali metal or an alkaline earth metal. The water is deionized water.