| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a display device, which improves use efficiency of a substrate by making a pattern region for interlayer shift measurement small. SOLUTION: On an insulating substrate on which the pattern for interlayer shift measurement on which interlayer shift measurement is based is formed as a first layer pattern together with a pattern formed in a display region, a second layer to be patterned after the first layer pattern is formed; and part of photoresist, applied on the second layer, on the pattern for interlayer shift measurement is subjected to a halftone exposure, and photoresist in the display region is subjected to normal exposure and development to form a resist pattern. After a shift between the resist pattern on the pattern for interlayer shift measurement and the pattern for interlayer shift measurement is measured, the resist pattern on the pattern for interlayer shift measurement is removed by ashing while the resist pattern in the display region is left, the remaining resist pattern in the display region is used as a mask to pattern the second layer in the method of manufacturing the display device. COPYRIGHT: (C)2009,JPO&INPIT
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