| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve the problem that, when a contact layer positioned in another layer overlaps a narrow line&space pattern, that becomes a semi-transmissive pattern, disposed to remain a part of exposure light, for example, it is judged as disconnection electrically, so that, the contact region should be excluded as a rule violation, originally, namely, it is difficult to verify the contact region using a design rule checker. <P>SOLUTION: A region including a narrow line&space pattern is defined as a second region and the pattern and a normal pattern adjacent to the second region are handled as one aggregate pattern. When a mask including the second pattern is used, the intensity of light transmitted through second black and white regions is averaged and the light can be handled as a normal pattern for obtaining halftone light intensity. Therefore, processing can be performed using a rule checker such as DRC, LVS, ERC and the like, bugging is suppressed and the layout pattern can be obtained more accurately. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
