| 摘要 |
PROBLEM TO BE SOLVED: To solve problems in manufacture of a photosensor used for an X-ray imaging and displaying apparatus or the like, wherein, since it is necessary to execute failure check of a photodiode tests must be executed in two conditions such as a dark condition and a light illumination condition to an array substrate for a photosensor, however, on-resistance of a TFT is reduced because light is emitted to a back channel side in the light illumination condition when an inversely staggered TFT is used as a guard resistance, and the size of the photosensor can be improved by miniaturization but cannot be reduced below the minimum required size due to the countermeasure against static electricity. SOLUTION: In this photosensor, a guard resistance 400 is formed with TFTs 201 and 202, and light is blocked by a shade film 21a formed above a back channel. COPYRIGHT: (C)2009,JPO&INPIT
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