| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist material that is highly sensitive, has high-resolution, has both a chemical amplification function and a non-chemical amplification function, and is suitable as a material for forming a fine pattern for making a VLSI or a photomask. <P>SOLUTION: The positive resist material contains a high-molecular compound having a repeating unit of (a), (b-1) or (b-2) in the general formula (1). <P>COPYRIGHT: (C)2009,JPO&INPIT |
