| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive polymer composition having high radiation sensitivity and useful for forming a patterned polymer film obtained by development with an aqueous alkali solution and having high transparency, a low dielectric constant, high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high heat resistance and excellent adhesion to a substrate. <P>SOLUTION: The positive photosensitive polymer composition contains a copolymer formed by radical polymerization of monomers including a radical polymerizable monomer (a1) having a (meth)acryloyl group and an alkoxy end-blocked polyalkylene glycol group, and a 1,2-quinonediazide compound, wherein the composition may further contain a copolymer formed by radical polymerization of monomers not including the monomer (a1). <P>COPYRIGHT: (C)2009,JPO&INPIT |
