发明名称 MANUFACTURING METHOD FOR LIQUID JET APPARATUS, LIQUID JET APPARATUS AND LIQUID JET APPARATUS MANUFACTURING PROGRAM
摘要 PROBLEM TO BE SOLVED: To solve such a problem that irregularities are generated on a medium when jetting of a liquid is carried out to the medium in an undulate posture. SOLUTION: A manufacturing method for a liquid jet apparatus which can jet the liquid from each nozzle by driving a piezoelectric element provided for every plurality of nozzles includes the correction information acquiring process of acquiring correction information for each nozzle which is responsive to a difference of distances between each nozzle and the medium to be a jet object of the liquid, and the piezoelectric element driving process of driving the piezoelectric element corresponding to each nozzle by a driving condition conformed to the acquired correction information for each nozzle. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009166272(A) 申请公布日期 2009.07.30
申请号 JP20080004043 申请日期 2008.01.11
申请人 SEIKO EPSON CORP 发明人 OKITA KENJI
分类号 B41J2/045;B41J2/01;B41J2/055 主分类号 B41J2/045
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